Plasma Coat
The PlasmaCoat is a DC magnetron sputtering apparatus used for the deposition of multilayer thin film optical coatings also often referred to as optical filters which are of crucial importance for a large number of important applications, from optics to sensors and even to nuclear fusion where inertial confinement by high power lasers depends critically on large area dielectric mirrors
The PlasmaCoat was designed for small batch high throughput production and uses a patented reactive magnetron sputtering process resulting in the production of dense optical coatings with outstanding durability for the manufacture of single or multilayer thin film filters. The target materials used in the PlasmaCoat are typically silicon and zirconium for the deposition of silica (SiO2) and zirconia (ZrO2) although other target materials can be used. Silica and zirconia are optimal for precision optics applications.
This technology uses a reactive magnetron sputtering process to produce dense optical coatings with outstanding durability. Coatings can be applied to mineral, glass as well as to a variety of plastics including hardcoated CR39 and polycarbonate. The machine is usually supplied for deposition of multilayers incorporating two materials. Silicon dioxide is the low index material and zirconium oxide is supplied as the high index material. However other materials such as niobia, titania, hafnia and tantala are available. These materials are ideal for precision optics and photonics applications.
Three Magnetron Plasma Coat
Three (3) magnetron positions are available in the walls of the vacuum chamber. Three magnetrons are supplied as standard. The magnetrons are directly cooled to enable efficient coating deposition and are designed to produce intense ion bombardment of the substrates during deposition.
The magnetrons are powered using pulsed DC or DC with a DC plasma source located remotely from the sputter targets.The magnetic arrangement and strength of the magnetrons are optimised for each system.
The systems enable coating deposition to be carried out using a high density of low energy bombarding ions at room temperature. This results in deposition of very dense, amorphous coating structures with low internal stresses.
The magnetrons are housed in a metal frame that allows for easy implementation for the magnetron(s) to be removed to ease target material replacement. Target material is bonded onto a copper backing plate, which is then mounted onto the magnetron body.
The system will be supplied with 3 targets as advised by the customer.
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